The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 30, 2003
Filed:
Nov. 29, 2001
Takeshi Mitsuishi, Tokyo, JP;
Hitoshi Kamura, Tokyo, JP;
Kenichi Shinde, Tokyo, JP;
Hiroki Takei, Tokyo, JP;
Akinori Kobayashi, Tokyo, JP;
Yukihiro Takahashi, Tokyo, JP;
Yuko Watanabe, Tokyo, JP;
Hoya Corporation, Tokyo, JP;
Abstract
A method for producing a composition for vapor deposition comprising sintering a vapor source mixture prepared by mixing vapor sources that contain titanium dioxide and niobium pentoxide. The method is capable of forming a high-refraction layer even in low-temperature vapor deposition on a substrate. An antireflection film is formed having good scratch resistance, good chemical resistance and good heat resistance, of which the heat resistance decreases little with time, that is useful in a variety of optical elements.