The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 30, 2003
Filed:
Nov. 29, 2001
Applicant:
Inventor:
David Trommer, Kfar Vradim, IL;
Assignee:
MPM Ltd., Haifa, IL;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B24B 7/00 ;
U.S. Cl.
CPC ...
B24B 7/00 ;
Abstract
A polishing system comprising one or more magnetic units able to produce a magnetic field is provided. The magnetic units may cause a polishing material to become plasticized and the plasticized material is able to polish a surface of a work piece. The polishing material may intermittently and repeatedly contact with the surface for polishing. A method for engraving or embossing a predefined pattern in a surface during magneto-rheological polishing of the surface is also provided.