The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 30, 2003

Filed:

Mar. 28, 2001
Applicant:
Inventors:

Xiao-Jing Lu, Avon, CT (US);

Gary J. Gauer, South Windsor, CT (US);

David A. Jacob, Hilton, NY (US);

Erich Minier, Rochester, NY (US);

Assignee:

Reflexite Corporation, Avon, CT (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 5/124 ;
U.S. Cl.
CPC ...
G02B 5/124 ;
Abstract

A retroreflective structure includes a retroreflective sheeting having an array of transparent prisms formed into pairs of prisms. Each prism includes a base aperture and three intersecting lateral faces meeting at an apex. Each of the lateral faces includes a base edge which forms a portion of the perimeter of the base aperture. The base edge of each lateral face intersects the base edge of a contiguous lateral face to form a base point, the first face of at least one prism in the array including a first face first planar surface and a first face second planar surface. The first face first planar surface and the first face second planar surface are contiguous along an edge having a first and second end points, wherein the apex, the first end point, and a first base point are coplanar and form a continuous edge from the first base point to the apex.


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