The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 23, 2003

Filed:

Mar. 18, 2002
Applicant:
Inventors:

Hisataka Takenaka, Tokyo, JP;

Takayasu Mochizuki, Tokyo, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G21K 1/06 ;
U.S. Cl.
CPC ...
G21K 1/06 ;
Abstract

An x-ray generation apparatus includes an x-ray reflecting mirror and x-ray generation part. The x-ray reflecting mirror is formed on an inner surface of a concave aspheric surface. The x-ray generation part receives at least one incident energy beam. The x-ray generation part is arranged near a focal point including a focal point of a paraboloid, and the x-ray reflecting mirror has at least one aperture formed in a position except for a part of the concave aspheric surface crossing an axis including the focal point of the concave aspheric surface, and an incident energy beam irradiates the x-ray generation part through the aperture.


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