The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 23, 2003
Filed:
Jul. 17, 2001
Samsung Electronics Co., Ltd, Suwon, KR;
Abstract
There is provided a metal etching mask fabrication method. Chrome is first sputtered on a silica layer and a photoresist, which is thicker than the chrome layer, is deposited on the chrome layer. The photoresist layer is patterned, a first nickel is sputtered on the photoresist pattern layer and onto a first portion of the chrome layer exposed by the patterning. A second nickel layer is formed on the portions of the first nickel layer in contact with the first portion of the chrome layer by electroplating. The photoresist pattern has side walls having acute angles to prevent contact between the first nickel layer on the photoresist and the second nickel layer on the first portion of the chrome layer. The photoresist pattern layer and the first nickel layer formed on the photoresist pattern layer are removed using a solvent, and the chrome layer is removed by dry etching in plasma using a gas.