The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 23, 2003
Filed:
Feb. 13, 2001
Murty S. Polavarapu, Vienna, VA (US);
Bae Systems and Information and Electronic Systems Integration Inc., Nashua, NH (US);
Abstract
A process for selectively removing a silicon-containing material through use of a byproduct of a chemical vapor deposition is disclosed. The process includes fabricating an insulating film upon a silicon base layer such that the insulating film includes a cavity. A diffusion barrier layer is deposited into the cavity. The diffusion barrier layer is formed during a chemical vapor deposition which produces an alkyl halide as a byproduct. A photoresist layer is fabricated upon a silicon-containing material. A portion of the photoresist is removed, thereby exposing a portion of the silicon-containing material. The exposed portion of the silicon-containing material is removed with a chemical etch solution including the alkyl halide.