The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 23, 2003
Filed:
Sep. 28, 2000
Stuart K. Janikowski, Idaho Falls, ID (US);
William J. Toth, Idaho Falls, ID (US);
Daniel M. Ginosar, Idaho Falls, ID (US);
Charles A. Allen, Idaho Falls, ID (US);
Mark D. Argyle, Idaho Falls, ID (US);
Robert V. Fox, Idaho Falls, ID (US);
W. Alan Propp, Idaho Falls, ID (US);
David L. Miller, Idaho Falls, ID (US);
Bechtel BWXT Idaho, LLC, Idaho Falls, ID (US);
Abstract
The present invention is related to systems and methods for modifying various non-equidimensional substrates with modifying agents. The system comprises a processing chamber configured for passing the non-equidimensional substrate therethrough, wherein the processing chamber is further configured to accept a treatment mixture into the chamber during movement of the non-equidimensional substrate through the processing chamber. The treatment mixture can comprise of the modifying agent in a carrier medium, wherein the carrier medium is selected from the group consisting of a supercritical fluid, a near-critical fluid, a superheated fluid, a superheated liquid, and a liquefied gas. Thus, the modifying agent can be applied to the non-equidimensional substrate upon contact between the treatment mixture and the non-equidimensional substrate.