The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 16, 2003
Filed:
Nov. 06, 2000
Applicant:
Inventors:
Assignee:
Canon Kabushiki Kaisha, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 7/24 ;
U.S. Cl.
CPC ...
H01J 7/24 ;
Abstract
Provided are a discharge generating apparatus, a discharge generating method, and a gas decomposing method capable of generating a large amount of an atmospheric plasma and increasing processing efficiency of a plasma processing, gas decomposition, or the like, by such a configuration that at least either one of high-potential and low-potential electrodes is comprised of a plurality of electrodes, a space between the electrodes is filled with an inorganic dielectric having a structure permitting flow of a gas, and a glow discharge is generated between the electrodes to change the gas existing between the electrodes, into a plasma under ordinary pressure.