The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 16, 2003
Filed:
Mar. 29, 2002
Alain P. Blosse, Belmont, CA (US);
Saurabh Dutta Chowdhury, Belmont, CA (US);
Cypress Semiconductor Corp., San Jose, CA (US);
Abstract
A method is provided for fabricating a device, which includes device components and spacings that may each have a final dimension that is smaller than a minimum dimension obtainable by a photolithography process used to form the device components. In particular, the method may include patterning an upper layer of the semiconductor topography using the photolithography process to form a device mask having dimensions substantially equal to or greater than the minimum dimension. The method may further include trimming the device mask and forming a semiconductor structure in alignment with the trimmed device mask. In addition, the method may include patterning the semiconductor structure to form device components and spacings therebetween. In general, patterning the semiconductor structure may include tapering a first layer of the semiconductor structure and removing an exposed portion of a second layer of the semiconductor structure.