The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 16, 2003

Filed:

Nov. 22, 2000
Applicant:
Inventors:

John Lynde Anderson, Chattanooga, TN (US);

Ross F. Russell, Chattanooga, TN (US);

David O. Hanon, Ringgold, GA (US);

James Nelson Edwards, Chattanooga, TN (US);

Assignee:

ERA Systems, Inc., Chattanooga, TN (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B01L 3/02 ; G01N 2/129 ; G01N 3/508 ; G01N 1/10 ; G01N 3/500 ; G05D 9/00 ; G05D 7/00 ; B01D 1/00 ;
U.S. Cl.
CPC ...
B01L 3/02 ; G01N 2/129 ; G01N 3/508 ; G01N 1/10 ; G01N 3/500 ; G05D 9/00 ; G05D 7/00 ; B01D 1/00 ;
Abstract

The drop-by-drop evaporation of a liquid or solution is controlled by monitoring the disappearance of each successive droplet and by actuating the deposition of the next droplet until the desired volume is deposited. In the case of a solution, non-volatile residue (NVR) is collected on a deposition surface plate as a relatively small mound. One of a variety of methods may be employed to measure the evaporative behavior of each droplet and to key the deposition procedure. The process is preferably carried out employing a clean deposition surface plate that is maintained at or below the boiling point of the particular liquid or solvent being deposited. The environment is preferably controlled so that inadvertent contamination is precluded from interfering, and thus the method permits the automatic, micro-processor controlled evaporation of liquids with the resultant deposition of non-volatile residues from solutions within relatively short periods of time. The deposited residue may then be quantified at levels down to and below about 1 ug/mL (1 mg/L) by one of several means for determining the amount of non-volatile residue remaining.


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