The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 16, 2003
Filed:
Jul. 13, 2000
Shi-Ho Wang, Lake Forest, CA (US);
Chih-Hsing Cheng, Fullerton, CA (US);
Sharon Doh, Aliso Viejo, CA (US);
Simax Technologies, Inc., Irvine, CA (US);
Abstract
A process which uses sol-gel to process oxide-based monoliths which are virtually free of cracks, without nullifying the desired attributes of the oxide-based monoliths. The method comprises substantially drying a wet porous gel monolith by removing a portion of the liquid from the pores of the gel monolith while the gel monolith remains wet, shrinking in size, and becoming correspondingly more dense, then removing the remaining portion of the liquid from the pores of the gel monolith such that the outer region of the gel monolith is not dried before the inner region of the gel monolith is dried. The gel monolith is substantially dried under conditions in which the liquid evaporation rate is no greater than the pore liquid diffusion rate.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile