The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 09, 2003
Filed:
Jan. 29, 2002
Berthold Kriegshauser, Rio de Janeiro, BR;
Steve McWilliams, Durango, CO (US);
Otto Fanini, Houston, TX (US);
Liming Yu, Stafford, TX (US);
Baker Hughes Incorporated, Houston, TX (US);
Abstract
A fast, efficient and accurate pseudo 2-D inversion scheme for resistivity determination of an anisotropic formation uses data from a tool (3DEX) comprising three transmitters and three corresponding receivers sampling the formation in a plurality of spatial directions. An initial model of the formation including invasion zones is obtained using a conventional multifrequency and/or multispacing logging tool. A pseudo 2-D inversion scheme combines an accurate full 2-D forward solution of the synthetic responses of the earth model with a 1-D approximation of the sensitivity matrix of the horizontally layered anisotropic background model. The timesaving compared to a regular 2-D inversion scheme can be tremendous. The applicability of this scheme is important in cases when borehole and near-zone effects do not allow an interpretation based on 1-D inversion. A comparison of the pseudo 2-D inversion scheme versus a full 2-D inversion using a realistic synthetic example shows that the pseudo 2-D inversion scheme performs as well as the full 2-D inversion, but in a much shorter time.