The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 09, 2003
Filed:
Jul. 09, 2002
John Carl Schotland, Ladue, MO (US);
Paul Scott Carney, Champaign, IL (US);
Washington University, St. Louis, MO (US);
Abstract
A methodology and concomitant system for three-dimensional near-field microscopy achieves subwavelength resolution of an object via total internal reflection. The features of this approach include: (i) the evanescent waves used for illumination encode on the scattered field the subwavelength structure of the scattering object—it is thus possible to obtain subwavelength resolved images of the sample as is done in other near-field techniques such as near-field scanning optical microscopy without the technical difficulties encountered with probe-sample interactions; and (ii) the results of the reconstruction are unambiguous in the sense that the relation between the scattered field and the three-dimensional structure of the sample, as described by the spatial dependence of the susceptibility, is made manifest.