The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 09, 2003
Filed:
Nov. 14, 1997
William P. Parker, Waitsfield, VT (US);
Julie W. Parker, Waitsfield, VT (US);
Diffraction, LTD, Waitsfield, VT (US);
Abstract
An optically made, high-efficiency in-line holographic mask (ILHM) for in-line holographic patterning of a workpiece, and apparatus and methods for performing same. The ILHM combines the imaging function of a lens with the transmission properties of a standard amplitude mask, obviating the need for expensive projection optics. The ILHM is either a type I (non-opaque) or type II (opaque) specialized object mask having one or more substantially transparent elements which can be phase-altering, scattering, refracting and/or diffracting. A method of creating a pattern on a workpiece includes the steps of disposing an ILHM, disposing a workpiece adjacent the ILHM and illuminating the ILHM to impart a pattern to the workpiece. In another method, the ILHM is used in combination with a lens. The ILHM is disposed such that a holographic real image is formed at or near the lens object plane, and the workpiece is disposed at or near the lens image plane. Apparatus for patterning a workpiece using an ILHM are also disclosed.