The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 09, 2003

Filed:

Aug. 29, 2001
Applicant:
Inventors:

Bernd Bruchmann, Freinsheim, DE;

Erich Beck, Ladenburg, DE;

Hans Renz, Meckenheim, DE;

Rainer Königer, Ludwigshafen, DE;

Reinhold Schwalm, Wachenheim, DE;

Matthias Lokai, Enkenbach-Alsenborn, DE;

Wolfgang Reich, Maxdorf, DE;

Assignee:

BASF Aktiengesellschaft, Ludwigshafen, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08G 8/300 ;
U.S. Cl.
CPC ...
C08G 8/300 ;
Abstract

Compounds having isocyanate groups with or without blocking, allophanate groups and free-radically polymerizable C—C double bonds, the C—C double bonds being in activated form by virtue of a carbonyl group attached directly to them or by virtue of an oxygen atom in ether function (activated double bonds), derived from polyisocyanates and alcohols A which in addition to the alcohol group also carry an activated double bond (compounds I). The invention additionally relates to radiation-curable formulations and coating compositions comprising the compounds I, to methods for coating using these substances, and to coated articles produced using these methods. Furthermore, the invention relates to the use of the compounds I in radiation-curable compositions such as in casting compositions, dental compounds, composite materials, sealing compounds, adhesives, troweling compounds, printing inks, in photostructurable compositions such as solder resists, photoresists, photopolymeric printing plates, and stereolithography resins.


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