The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 09, 2003
Filed:
Mar. 29, 2002
HongYing Wang, Fremont, CA (US);
Koichi Wago, Sunnyvale, CA (US);
Neil Deeman, Alamo, CA (US);
Nobuo Kurataka, Campbell, CA (US);
Seagate Technology LLC, Scotts Valley, CA (US);
Abstract
A system and method for forming servo patterns on magnetic medium is disclosed. A magnetic film coated with a layer of styrene-acrylonitrile is stamped with a nickel stamper reproducing the negative image of the stamper pattern on the styrene-acrylonitrile. Ions are then accelerated towards the surface of the styrene-acrylonitrile, which stops the ions in the areas where the styrene-acrylonitrile is thick and allows the ions to penetrate through to the magnetic layer in the areas where the styrene-acrylonitrile is thin. The ions, which penetrate through to the magnetic layer, interact with the magnetic layer altering the magnetic layer's structure reducing its coercivity (Hc) and remnant moment (Mrt). This reproduces the stamped styrene-acrylonitrile pattern on the magnetic layer. The styrene-acrylonitrile is then removed by oxygen plasma etching the surface leaving behind a patterned magnetic medium.