The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 02, 2003
Filed:
Apr. 27, 2000
Applicant:
Inventors:
Nobuo Ogata, Nara, JP;
Chiaki Kiyooka, Tenri, JP;
Makoto Horiyama, Nara, JP;
Kohji Minami, Gose, JP;
Takahiro Miyake, Soraku-gun, JP;
Yasuo Nakata, Takaichi-gun, JP;
Assignee:
Sharp Kabushiki Kaisha, Osaka, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G11B 7/00 ;
U.S. Cl.
CPC ...
G11B 7/00 ;
Abstract
Beam shaping means may have a shaping ratio set to allow a light beam emitted from a semiconductor laser and having an elliptic intensity distribution to have an ellipticity of no more than two to obtain a spot achieving high light availability and reduced in size. Furthermore, the shaping ratio can be set to no more than 2.5 to allow a polalized-beam splitter (light separation means) and other components to be arranged in a converged flux passing between the semiconductor laser and a collimator lens.