The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 02, 2003
Filed:
Nov. 30, 2001
Applicant:
Inventors:
David C. Hall, Murphy, TX (US);
Juanita G. Miller, Sachse, TX (US);
Assignee:
Texas Instruments Incorporated, Dallas, TX (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 2/131 ; H01L 2/1469 ; B05D 3/12 ;
U.S. Cl.
CPC ...
H01L 2/131 ; H01L 2/1469 ; B05D 3/12 ;
Abstract
A method for spin coating high viscosity materials. Two dispense steps are used. The first dispense step dispenses a small amount ( ) of high viscosity material at the center of the wafer ( ). A high-speed wafer rotation spreads the material to form a thin layer ( ) to prime the surface of the wafer ( ) and lower the surface tension without regard to uniformity. A second dispense step occurs at lower RPM and coats ( ) the wafer ( ) more uniformly.