The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 02, 2003
Filed:
Mar. 09, 2001
Mark Norman Paul Craddock, Gauteng, ZA;
Michael Roy Kilner, Gauteng, ZA;
Warren Wentworth Dale, Gauteng, ZA;
General Signal Corporation, Muskegon, MI (US);
Abstract
An apparatus for recovering a desired fraction of a raw material bearing the desired fraction has a vessel or cell defining a treatment chamber therein, with an inlet into the chamber for introducing a slurry of raw material to be treated into the chamber. An attrition zone is defined in a portion of the chamber proximate the inlet in the flow path of material introduced into the chamber, the particles being caused to impact against each other in the attrition zone to cause attritioning thereof. A floatation zone is defined in a distal portion of the chamber, in flow communication with the attrition zone, in which attritioned particles from the attrition zone can be contacted with gas bubbles to form a froth phase separated from the slurry by a slurry-froth interface such that the desired fraction is either selectively taken up into the froth phase by the gas bubbles or selectively left behind in the slurry. An outlet from the chamber for the froth phase is present.