The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 26, 2003

Filed:

Nov. 15, 2000
Applicant:
Inventors:

Alexander Knuttel, Birkenau, DE;

Paul Welker, Bissersheim, DE;

Christian Kugler, Schwetzingen, DE;

Reiner Rygiel, Dossenheim, DE;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01B 9/02 ;
U.S. Cl.
CPC ...
G01B 9/02 ;
Abstract

The invention proposes a method for the optimization of the interferometric examination of scattering objects, wherein intensity-modulated light is divided, one beam is directed into an object and the other beam is directed to a reference mirror, the reflected light is guided to a detector module, where it is converted to an interference signal and this signal is evaluated. The method is characterized by the fact that light of at least two different central wavelengths is irradiated and the converted interference signals of both central wavelengths are phase-shifted in order to compensate for their expected dispersion.


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