The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 26, 2003
Filed:
Jun. 25, 2001
Cha-won Koh, Seoul, KR;
Sung-eun Hong, Gyunggi-Do, KR;
Min-ho Jung, Gyunggi-Do, KR;
Jin-soo Kim, Daejeon-shi, KR;
Geun-su Lee, Gyunggi-Do, KR;
Jae-chang Jung, Gyunggi-Do, KR;
Hynix Semiconductor Inc, Gyunggi-do, KR;
Abstract
A method for forming a micro-pattern of a semiconductor substrate, and more particularly, to a method for preventing defects in a photoresist pattern, such as undercut or footing, due to inter-mixing between an organic anti-reflective coating and a photoresist by forming a carbonized layer on the surface of the organic anti-reflective coating by a curing process like ion implantation or E-beam curing.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile