The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 19, 2003
Filed:
Jul. 12, 1999
Koji Urasawa, Tokyo, JP;
Oki Data Corporation, Tokyo, JP;
Abstract
There is disclosed a method wherein an origin is set on the dither pattern and the dither pattern is rotated relative to the origin by a required screen angle. By rotating the dither pattern, real-number coordinates of an origin of adjacent dither patterns are obtained. Coordinates of the origin of the adjacent dither pattern are corrected by rounding fractions of the real-coordinate so that the real-number coordinates are changed to integer coordinates. An angle which a segment connecting an origin of the dither pattern to be based on and that of the adjacent dither pattern obtained after the correction forms with a horizontal line is selected as a screen angle. By this, the shape of the dither pattern obtained after being rotated becomes uniform, preventing the occurrence of moire.