The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 19, 2003
Filed:
May. 02, 2000
Timothy S. Milliron, Berkeley, CA (US);
Pixar Amination Studios, Emeryville, CA (US);
Abstract
Techniques for geometric deformations in computer graphics are described, including a flexible and general modular methodology for constructing, analyzing, and evaluating geometric warps and deformations. Described techniques include establishing a set of source/target features (and related information) or parameter set for controlling deformation of a graphical model; a set of strength fields are established for controlling how strongly the transformation caused by the mapping of source feature to target feature will be applied to model points. A set of weighting fields modulates the influence of multiple source/target feature mappings on model points. Also described are variations on this technique that allow achieving results similar to conventional methods and additional functionality.