The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 19, 2003
Filed:
Nov. 01, 2000
Kourosh Saadatmand, Merrimac, MA (US);
Michael A. Graf, Cambridge, MA (US);
Edward K. McIntyre, Franklin, MA (US);
Other;
Abstract
A mass analysis magnet assembly ( ) is provided for use in an ion implanter ( ), comprising: (i) a magnet ( ) for mass analyzing an ion beam ( ) output by an ion source ( ), the magnet providing an interior region ( ) through which the ion beam passes; and (ii) at least one strike plate ( ) in part forming an outer boundary of the interior region ( ). The at least one strike plate is comprised of an isotopically pure carbon-based material. The isotopically pure carbon-based material, preferably by mass greater than 99% carbon C-12, prevents neutron radiation when impacted by deuterons extracted from the ion source ( ). The strike plate ( ) may comprise an upper layer ( ) of isotopically pure carbon C-12 isotope positioned atop a lower substrate ( ).