The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 19, 2003

Filed:

Dec. 29, 2000
Applicant:
Inventor:

Keuk-Sang Kwon, Kumi-shi, KR;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 2/100 ; H01L 2/1302 ; H01L 2/1461 ; H01L 3/100 ;
U.S. Cl.
CPC ...
H01L 2/100 ; H01L 2/1302 ; H01L 2/1461 ; H01L 3/100 ;
Abstract

An array substrate for use in an X-ray sensing device is fabricated using an etching stopper that enables good control of the etching process and that prevents over-etch of drain electrodes and second capacitor electrodes while forming contact holes and a cutting furrow. The etching stopper is located in a tiling portion that is utilized for tiling substrates to form a large-sized X-ray detector. During fabrication, gate lines can have gate-protruded portions located near the etching stopper, and the etching stopper can have stopper-protruded portions near the gate lines. The stopper-protruded portions electrically connect to the gate-protruded portions through gate line contact holes such that the etching stopper and the gate lines have equipotentials. This can reduce static electricity damage.


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