The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 19, 2003
Filed:
Jan. 30, 2001
James J. Sun, New Brighton, MN (US);
Benjamin Y. H. Liu, North Oaks, MN (US);
MSP Corporation, Shoreview, MN (US);
Abstract
A deposition system is used for depositing particles onto a substrate, such as a wafer in a deposition chamber. The particles are carried in an aerosol that is generated by an atomizer that includes an impaction plate for removing large particles before the aerosol is discharged, and which has an output that is provided through a particle classifier to the deposition chamber. Various branches of flow lines are used such that the aerosol that has classified particles in it, is mixed with a clean dry gas prior to discharge into the deposition chamber, and selectively the aerosol can be directed to the deposition chamber without having the particles classified. The lines carrying the aerosol can be initially connected to a vacuum source that will quickly draw the aerosol closely adjacent to the deposition chamber to avoid delays between deposition cycles.