The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 12, 2003

Filed:

Sep. 05, 2000
Applicant:
Inventor:

Ramesh Divakar, Shrewsbury, MA (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 1/600 ;
U.S. Cl.
CPC ...
C23C 1/600 ;
Abstract

An electrostatic chuck includes a chuck body having a chucking surface and a back surface, an electrode within the chuck body and at least one conduit for providing fluid communication between the back surface and a chucking surface. The conduit includes a porous region which is integrated with the chuck body. During operation, the temperature of a wafer supported by the electrostatic chuck can be controlled or modified by directing a heat transfer fluid, through the porous region, to the chucking surface. The porous region prevents or minimizes plasma penetration and arcing problems. Also described are methods of fabricating an electrostatic chuck having a porous region.


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