The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 12, 2003
Filed:
Sep. 20, 2001
Applicant:
Inventors:
Shinji Takasugi, Yokohama, JP;
Mitsuru Ikezaki, Sagamihara, JP;
Assignee:
International Business Machines Corporation, Armonk, NY (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02F 1/1343 ;
U.S. Cl.
CPC ...
G02F 1/1343 ;
Abstract
Disclosed is a manufacturing method of a liquid crystal display device that prevents luminance change in a sub-pixel where exposed portions overlap each other. A substrate is dividedly exposed in patterning a TFT array substrate of a liquid crystal display device. In an exposure process of using a resist, the substrate is divided into a plurality of divided regions. The portion subjected to a double exposure is set in a nonlinear manner within the sub-pixel. By providing such an arrangement, the portion subjected to double exposure is set so as not to overlap a storage capacitor or a signal line.