The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 12, 2003
Filed:
Mar. 30, 2001
Ayelet Pnueli, Rehovot, IL;
Ariel Ben-Porath, Rehovot, IL;
Appleid Materials, Inc,, Santa Clara, CA (US);
Abstract
A kill index classification method for prioritizing relational aspects of topological defect intersections, particularly in association with an intermediate analytical testing stage of a multi-stage semiconductor fabrication process. The method relates to an analysis of the geometrical relationship between non-predetermined portion(s), generally referred to as defects, and the surrounding predetermined topology of a conductive semiconductor pattern, to determine the effect of defects on the functionality and reliability of a wafer, and particularly an examined die thereon. Further, in accordance with this geometrical information, a preferred classification of the effects of defects into a numerical value, the “kill index”, is achieved. Preferably, this kill index is strongly linked, correlated and related to the damage caused by the defect to the functionality and/or reliability of the underlying integrated circuit.