The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 12, 2003
Filed:
Aug. 06, 2001
Applicant:
Inventors:
Uwe Paul Schroeder, Dresden-Langebrueck, DE;
Tobias Mono, Dresden, DE;
Veit Klee, Pleasant Valley, NY (US);
Assignee:
Infineon Technologies, AG, Munich, DE;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 9/00 ; G03F 7/00 ; H01L 2/138 ;
U.S. Cl.
CPC ...
G03F 9/00 ; G03F 7/00 ; H01L 2/138 ;
Abstract
An alternating phase shift mask ( ) and method of manufacturing thereof including assist edges ( ) and ( ) surrounding a main phase edge ( ). Assist edges ( ) and ( ) improve the resolution of the alternating phase shift mask ( ), thus enabling the patterning of smaller size features on a semiconductor wafer.