The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 12, 2003

Filed:

Jul. 20, 2000
Applicant:
Inventors:

Dafiné Ravelosona-Ramasitera, Orsay, FR;

Claude Chappert, Garches, FR;

Véronique Mathet, Palaiseau, FR;

Harry Bernas, Paris, FR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05D 3/06 ; B05D 5/00 ; C23C 1/448 ; C23C 1/414 ; C30B 1/02 ;
U.S. Cl.
CPC ...
B05D 3/06 ; B05D 5/00 ; C23C 1/448 ; C23C 1/414 ; C30B 1/02 ;
Abstract

The invention provides a method of treating a material to cause the material to evolve from one phase to a more ordered phase, the method comprising an operation of irradiating the material in which the irradiating particles are suitable, by their nature and by their energy, for inducing displacements of the atoms in the material towards positions that favor ordering of the material. Advantageously, the invention also provides apparatus for magnetically recording information, the apparatus comprising a material deposited on a substrate at a temperature of less than 350° C. and that has been subjected to irradiation with irradiating particles that are suitable, by their nature and their energy, for inducing displacements of the atoms in the material towards positions that favor relaxation of the material.


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