The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 12, 2003

Filed:

Dec. 19, 2000
Applicant:
Inventors:

Ullrich Steiner, Constance, DE;

Stefan Walheim, Allensbach, DE;

Erik Schäffer, Constance, DE;

Stefan Eggert, Allensbach, DE;

Jürgen Mlynek, Radolfzell, DE;

Assignee:

Universitat Konstanz, Constance, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08J 3/02 ; G02B 1/11 ; C03C 1/732 ; B05D 3/10 ; B05D 5/06 ; B05D 7/26 ; B05D 1/36 ;
U.S. Cl.
CPC ...
C08J 3/02 ; G02B 1/11 ; C03C 1/732 ; B05D 3/10 ; B05D 5/06 ; B05D 7/26 ; B05D 1/36 ;
Abstract

The invention relates to a method for producing an element comprising a substrate and at least one anti-reflection coating with pores. The dimensions of the anti-reflection coating are below the wavelength of visible light or the neighboring spectral ranges. The invention also relates to an element produced according to this method with at least one anti-reflection coating, for example optical lenses, mirrors or other optical components. The optical anti-reflection coating of these elements is essentially improved.


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Steiner, Ullrich. (2003). Process for producing antireflection coatings (U.S. Patent No. 6605229). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6605229

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