The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 05, 2003
Filed:
Aug. 23, 2000
Dae-Sik Cho, Seoul, KR;
Hee-Sun Chae, Kyunggi-do, KR;
Seok-Hyun Kim, Seoul, KR;
Seung-Hoon Tong, Seoul, KR;
Tae-Yang Yoon, Kyunggi-do, KR;
Doh-Soon Kwak, Kyunggi-do, KR;
Hee-Se Kang, Kyunggi-do, KR;
Yll-Seug Park, Kyunggi-do, KR;
Jae-Seok Oh, Kyunggi-do, KR;
Samsung Electronics Co., Ltd., Suwon, KR;
Abstract
A lot dispatching method and system for variably applying the most suitable processing equipment and/or processing condition in a succeeding process of a semiconductor manufacturing process, wherein the succeeding process is influenced by the result of a preceding process. A lot processed by the preceding process is dispatched to the succeeding processing equipment according to a systematic analysis result obtained from a relationship between a process result of the preceding process and an efficiency and the characteristics of a plurality of processing equipment in the succeeding process. A plurality of process conditions for the succeeding process corresponding to the performance of the preceding process is provided. A respective process condition has characteristics that minimize the difference in performance in the succeeding process from a desired or target performance. By systematically analyzing the quality of the lot waiting to be dispatched, the succeeding process is performed with the most suitable process condition.