The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 6604011 B1

PDF
Full Text
Expired
Date of Patent:
Aug. 05, 2003

Filed:

May. 23, 2001
Applicant:
Inventor:

Yukihiro Yokota, Utsunomiya, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06F 1/900 ;
U.S. Cl.
CPC ...
G06F 1/900 ;
Abstract

An original chuck for holding an original includes a plurality of attracting and holding portions for holding the original, each of the plurality of attracting and holding portions having a supporting member for supporting the original with point contact, and an attracting pad of an elastic material for surrounding the supporting member. The original chuck also includes an adjusting mechanism for adjustably moving at least one of the attracting and holding portions in a direction orthogonal to a supporting surface of a respective supporting member.


Find Patent Forward Citations

Yokota, Yukihiro. (2003). Reticle chuck in exposure apparatus and semiconductor device manufacturing method using the same (U.S. Patent No. 6604011). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6604011

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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