The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 05, 2003

Filed:

Nov. 06, 2000
Applicant:
Inventors:

Peter Bienstman, Melle, BE;

Roel Baets, Deinze, BE;

Assignee:

Other;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02B 1/10 ;
U.S. Cl.
CPC ...
G02B 1/10 ;
Abstract

A system and method for guiding a beam of electromagnetic radiation is disclosed. The system includes at least a first stack of dielectric layers, the first stack comprising at least a first substack, a second substack and a third substack, the third substack separating said first and second substack, the first substack comprising at least one dielectric layer, the second substack comprises at least one dielectric layer, the third substack comprises at least one dielectric layer. The dielectric layers of the first substack and the second substack equidistant from the third substack have the same refractive index. The sum of the thickness of dielectric layers of the first substack and the second substack equidistant from said third substack is a multiple of half of the vacuum wavelength of the beam divided by the refractive index of the dielectric layers of the first substack and the second substack having a same distance from the third substack, the third substack thickness being substantially different from a quarter of the vacuum wavelength of the beam divided by the refractive index of the one dielectric layer of the third substack.


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