The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 05, 2003
Filed:
Jun. 13, 2002
Applicant:
Inventor:
Dietrich Meier, Niedererlinsbach, CH;
Assignee:
Leica Geosystems AG, Unterentfelden, CH;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01B 1/126 ; G01B 1/102 ; G01C 1/700 ;
U.S. Cl.
CPC ...
G01B 1/126 ; G01B 1/102 ; G01C 1/700 ;
Abstract
In a laser tracking system equipped for interferometric distance measurement there are provided at least two retroreflectors ( ) which are connected to the target tracking mirror ( ) in a manner such that their position changes when the spatial orientation of the target tracking mirror ( ) is changed. Secondary measurement beams ( ) deflected out of the primary measuring beam ( ) of the laser tracking system are directed onto the retroreflectors ( ). Path length changes in the beam path of the secondary measurement beams ( ) are interferometrically measured and the readings are used for computing the spatial orientation of the target tracking mirror ( ).