The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 05, 2003
Filed:
Feb. 15, 2001
Michael K. Templeton, Atherton, CA (US);
Hao Fang, Cupertino, CA (US);
Maria C. Chan, San Jose, CA (US);
King Wai Kelwin Ko, San Jose, CA (US);
Advanced Micro Devices, Inc., Sunnyvale, CA (US);
Abstract
A method and system for providing an alignment mark for a thin layer in a semiconductor device is disclosed. The semiconductor device includes at least one alternative part having a first thickness greater than a second thickness of the thin layer. The method and system include providing the thin layer and providing the alignment mark for the thin layer in the at least one alternative part. The alignment mark has a depth that is greater than the second thickness of the thin layer. In one aspect, the method and system include providing a mask for the thin layer. The mask includes an alignment mark portion that covers the at least one alternative part and that is for providing the alignment mark. In this aspect, the method and system also include removing a portion of the at least one alternative part to provide the alignment mark in the at least one alternative part.