The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 05, 2003
Filed:
Jan. 24, 2002
Applicant:
Inventors:
Mitsuro Atobe, Suwa, JP;
Shinichi Kamisuki, Suwa, JP;
Ryuichi Kurosawa, Suwa, JP;
Shinichi Yotsuya, Suwa, JP;
Assignee:
Seiko Epson Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 3/300 ; H01L 2/978 ;
U.S. Cl.
CPC ...
H01L 3/300 ; H01L 2/978 ;
Abstract
The present invention provides a mask for use in forming a thin-layer pattern of an organic electroluminescence element having high-precision pixels. The mask is manufactured by wet-etching a (100) silicon wafer (single crystal silicon substrate) in a crystal orientation-dependent anisotropic fashion so as to form through-holes having (111)-oriented walls serving as apertures corresponding to a thin-layer pattern to be formed.