The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 05, 2003
Filed:
Jan. 03, 2002
Applicant:
Inventors:
Assignee:
Mitsubishi Gas Chemical Company, Inc., Chiyoda-ku, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/32 ;
U.S. Cl.
CPC ...
G03F 7/32 ;
Abstract
Developing solution for a photoresist comprising an alicyclic amine compound and a non-metallic alkali compound is described. The developing solution exhibits excellent wettability and dissolution selectivity to alicyclic compound-based resists. Also, the developing solution does not produce dissolution residues, and it makes it possible to reliably form ultra fine patterns.
Iwata, Keiichi. (2003). Developing solution for a photoresist and a method for developing the photoresist (U.S. Patent No. 6602654). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6602654
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile