The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 05, 2003
Filed:
Sep. 13, 2002
Applicant:
Inventor:
Markus Naujok, Wappingers Falls, NY (US);
Assignee:
Infineon Technologies AG, Munich, DE;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B24D 1/100 ;
U.S. Cl.
CPC ...
B24D 1/100 ;
Abstract
A polishing pad (for example, polishing pad ) for use in polarization of a semiconductor wafer (for example, semiconductor wafer ), the polishing pad featuring a plurality of different polishing surfaces, depending upon the direction of the movement of the polishing pad . The polishing pad may take the form of a polishing disc or a polishing belt. The polarization of the semiconductor wafer can then take place at a fewer number of polishing stations, thereby reducing the amount of time needed and reducing the probability of damage to the semiconductor wafer