The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 05, 2003

Filed:

Nov. 27, 2001
Applicant:
Inventors:

Wun-Myong Shin, Kyonggi-do, KR;

Sun-Kyu Kim, Kyonggi-do, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01B 2/100 ;
U.S. Cl.
CPC ...
G01B 2/100 ;
Abstract

To prevent process defects and wafer damage caused by improperly positioned wafers, a system and method for detecting a position of a wafer determines whether the wafer is properly positioned before executing a process. The system includes a chuck plate preferably having a supporting part configured to support a lower face of the wafer and a guide part located on a perimeter of the supporting part. A sensing unit senses a positional state of the wafer on an upper portion of the supporting part. A controller receives a signal corresponding to the positional state of the wafer from the sensing unit, and determines whether the wafer is properly positioned. The controller then sends an output control signal to an outputting unit to notify an operator of the wafer position. In this manner, process defects are avoided and a fabricating yield and operating rate of a fabrication unit increases.


Find Patent Forward Citations

Loading…