The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 22, 2003
Filed:
Aug. 07, 2000
Hiroshi Fujikawa, Tokyo, JP;
Mitsubishi Denki Kabushiki Kaisha, Tokyo, JP;
Abstract
A method of providing fabrication-historic data for a semiconductor device to a chip, has the step of: preparing a wafer with a pattern of a plurality of chips, where each chip has a product area to function as a semiconductor device and a fabrication-historical data area on which fabrication-historical data is to be held, wherein different fabrication-historical data is provided for each chip by exposing all of the chips on the wafer as a single unit by means of an exposure system using a mater mask while the product area of each chip is shielded from exposure or in one of the steps of forming the contact holes and carrying out wiring among the transistors. Consequently, the process can be easily performed because of the exposure in one operation using the master mask and thus the fabrication-historical data can be easily mounted on the chip.