The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 22, 2003
Filed:
Dec. 21, 2001
Applicant:
Inventors:
Atsushi Takakuwa, Shiojiri, JP;
Mutsumi Tamura, Suwa, JP;
Assignee:
Seiko Epson Corporation, , JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02B 2/710 ; G03B 2/160 ; G01B 1/100 ;
U.S. Cl.
CPC ...
G02B 2/710 ; G03B 2/160 ; G01B 1/100 ;
Abstract
A method for manufacturing a microlens array including the steps of forming a reflecting layer as a mark composed of at least one of a raised part and a recessed part in a first light-transmitting layer having a plurality of lenses and the mark, the reflecting layer having a higher reflectance than that of the first light-transmitting layer; and forming a second light-transmitting layer so as to cover at least the lenses.