The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 22, 2003

Filed:

Aug. 30, 2001
Applicant:
Inventors:

Sil-Gun Jeong, Gyeonggi-do, KR;

Kyoung-Shin Park, Gyeonggi-do, KR;

Hi-Youn Cho, Gyeonggi-do, KR;

Byeong-Cheol Park, Gyeonggi-do, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B23K 2/600 ;
U.S. Cl.
CPC ...
B23K 2/600 ;
Abstract

A method and an apparatus for marking an identification mark on a wafer. After the wafer is aligned, a laser beam is radiated onto a predetermined portion on the wafer so that the identification mark is engraved on the wafer. While the laser beam is being radiated, a gas blows towards the predetermined portion on the wafer so as to remove the particles which are created on the surface on the wafer caused by the radiation of the laser beam. A collecting and exhausting section is provided to collect and exhaust the gas that is mixed with the particles.


Find Patent Forward Citations

Loading…