The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 22, 2003
Filed:
Jan. 25, 2002
Applicant:
Inventors:
Hsueh Sung Tung, Getzville, NY (US);
Clayton Herbert Carson, Clarence Center, NY (US);
Hang Thanh Pham, Amherst, NY (US);
Assignee:
Honeywell International Inc., Morristown, NJ (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C07C 1/700 ;
U.S. Cl.
CPC ...
C07C 1/700 ;
Abstract
Disclosed is an improved HFC manufacturing processes of the type which produces an intermediate product stream that includes a mixture of HF and at least one compound, usually an HCFC, which is relatively resistant to further fluorination. The improvement involves separating the unreactive compound(s) from the product stream, preferably using liquid:liquid phase separation, and substantially avoiding recycle of the unreactive compound to the fluorination reaction. The separated unreactive compound(s) are substantially free of HF.