The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 22, 2003
Filed:
Jan. 16, 2002
Applicant:
Inventors:
John R. Andrews, Fairport, NY (US);
Cathie J. Burke, Rochester, NY (US);
Roger G. Markham, Webster, NY (US);
Assignee:
Xerox Corporation, Stamford, CT (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 2/1302 ;
U.S. Cl.
CPC ...
H01L 2/1302 ;
Abstract
12 Methods of forming features in polymeric materials by laser ablation techniques alone, or by the combined use of laser ablation techniques and photolithography, are disclosed. The methods can be used to pattern non-photosensitized materials, as well as photosensitized materials. The patterned features can have different shapes, dimensions and aspect ratios in the same polymer layer. Structures including the patterned features can include multiple layers formed of photosensitized and/or non-photosensitized polymer materials.