The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 22, 2003
Filed:
Jan. 25, 2000
Oliver Pohland, Sunnyvale, CA (US);
Kaichiu Wong, Sunnyvale, CA (US);
Cypress Semiconductor Corporation, San Jose, CA (US);
Abstract
Contact structures, methods for forming contact structures, and masks for forming contact structures are disclosed. According to one embodiment a contact hole ( ) may be formed with a contact hole mask ( ) that may have a generally rectangular shape and include corner extensions ( - to - ) and side indents ( - to - ). A long side of a contact hole ( ) may be aligned in the same direction as an active area ( ). A contact hole ( ) may be situated between a first portion ( - ) and a second portion ( - ) of an intermediate structure ( ). Alternate embodiments can include a “cactus” shaped intermediate structure ( ) that may be formed with an intermediate structure mask having corner indents ( ).