The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 22, 2003
Filed:
Mar. 27, 2000
Applicant:
Inventors:
Stephen D. Hersee, Albuquerque, NM (US);
David Zubia, Albuquerque, NM (US);
Steven R. J. Brueck, Albuquerque, NM (US);
Saleem H. Zaidi, Albuquerque, NM (US);
Assignee:
Science & Technology Corporation @ UNM, Albuquerque, NM (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C30B 2/502 ; B32B 9/00 ;
U.S. Cl.
CPC ...
C30B 2/502 ; B32B 9/00 ;
Abstract
A new and useful technique for growing an epilayer onto a substrate is provided. An epilayer is grown on a substrate by (a) providing a patterned substrate comprising a plurality of isolated nanoscale nucleation sites, and (b) growing an epilayer selectively on the nanoscale nucleation sites, in a manner which localizes strain at the substrate-epilayer interface, and enables strain to reduce as the thickness of the epilayer increases.