The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 22, 2003
Filed:
Jan. 30, 2001
Applicant:
Inventors:
Jöm-Steffen Liebig, Dresden, DE;
Klaus Goedicke, Dresden, DE;
Volker Kirchhoff, Dresden, DE;
Gerhard Keller, Saint Maur des Fosse, FR;
Richard Bosmans, Noiseau, FR;
Pascal Comble, Le Perreux, FR;
Assignee:
Essilor International, Charenton, FR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B32B 3/02 ;
U.S. Cl.
CPC ...
B32B 3/02 ;
Abstract
An organic substrate having optically-active layers deposited by magnetron sputtering and a preparation process for it are provided. Gas pressure used for carrying out better adhesion by sputtering is high, comprised between 0.8 and 5.0 Pa. Sputtering is particularly suitable for targets of Si, Ti, Zr and organic substrates with or without anti-abrasive coating. Improved adhesion of thin films is obtained.