The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 22, 2003

Filed:

May. 24, 2000
Applicant:
Inventors:

Gary H. Bernstein, Granger, IN (US);

Richard Frankovic, Beaverton, OR (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01R 4/302 ; B21C 2/300 ;
U.S. Cl.
CPC ...
H01R 4/302 ; B21C 2/300 ;
Abstract

Micromachined extrusions on the micrometer scale is realized using compressive stresses resulting from electromigration-induced mass transport in planarized conductors. Extrusions are formed through simple die patterns etched through a passivation layer overlaying the conductors.


Find Patent Forward Citations

Bernstein, Gary. (2003). Planar-processing compatible metallic micro-extrusion process (U.S. Patent No. 6594894). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6594894

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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